2Dinese
2DINESE is a two-dimensional topography simulator. It is primarily designed
for use in R&D in microelectronics and related fields, as well as, as an
educational tool at Universities and Research Institutes. The most advanced
and powerful features of 2Dinese are related to the simulation of a large
variety of Erosion and Deposition processes, which naturally is the essence
of topography simulation. Specifically, all types and combinations of
Chemical Vapor Deposition, Physical Vapor Deposition, Ion Beam Etching,
Reactive Ion Etching, Plasma Etching, Wet Chemical Etching, High Density
Plasma Deposition and Erosion, and interconnect layer formation. can be
simulated.